Apple Technical PhD Internship Optical Critical Dimension (OCD) Metrology and Modeling Development のご案内
2025年04月10日更新
Apple
Apple Technical PhD Internship Optical Critical Dimension (OCD) Metrology and Modeling Development のご案内
2025年04月10日更新
募集締切が過ぎています
勤務地
Yokohama, Kanagawa-ken, Japan
Description
- Develop RCWA-based OCD modeling methodologies for diffractive nanostructures.
- Identify critical degrees of freedom (DOF) and fitting parameters required for optimize diffractive element process maps
- Explore and propose techniques to enhance the accuracy of model fitting compared against ground truth experimental data
- Assess the Gauge Repeatability and Reproducibility (GR&R) of OCD equipment.
- Integrate RCWA findings and improve models for supporting design validation simulations and process control recommendations
Minimum Qualifications
・Strong academic background in optical physics, optical engineering, or a related field.
・Experience with OCD metrology, RCWA simulations, or similar optical modeling techniques.
・Analytical mindset with a focus on accuracy and detail in synthesizing simulated and experimental data
・Ability to work independently on complex, research-driven tasks while effectively communicating findings to the team.
・Must hold relevant work permit in Japan for the duration of the internship.
・Currently enrolled in a PhD Program
詳細、ご応募は下記リンクよりご確認ください。
弊サイトは情報の正確性に万全を期しておりますが、対象企業による募集情報の急な変更などにより、締切日等について最新の情報を掲載できない場合がございます。
大変お手数ですがご志望の企業につきましては、各社の求人情報ページにて最新の情報をご参照いただくようお願い致します。こちらの免責事項もご確認ください。
